Target magnetron sputtering material
I have found results from4000+products and1000+suppliers aboutTarget magnetron sputtering material
High Purity Aluminum Target Vacuum Magnetron Sputtering Target
PVD Thin Film Material Boron Magnetron Sputtering Target for Coating Machine
Sic PVD Material Silicon Carbide Plate Sputtering Target for Magnetron Sputtering System
Silicon Carbide Square Sputtering Target for Magnetron Coating Machine
Bismuth Magnetron Sputtering Target for PVD Coating
Alpo4 Sputtering Target for Magnetron Sputtering Coating
Supply Boron Sputtering Target for Magnetron Coating
Zrb2 Sputtering Target Zirconium Boride Magnetron Sputter Target From Xinkang Supplier
99.9% Pure Lead Sputtering Target High Purity Pb Target for Magnetron Coating
99.99% Pure Metal Titanium Magnetron Target High Purity Titanium Round Target for Sputtering
Pure Rhenium Sputter Target Metal Rhenium Plate for Magnetron Sputtering
99.9% Purity Cobalt Samarium Alloy Target Cosm 80/20 Wt% Alloy Material
99.95% Metal Niv7 Rotary Tube Nickel Vanadium Alloy Target Material with Polished Surface
Customized Batio3 Target Bto Ceramic Coating Material
Lanthanum Hexaborid Lab6 Ceramic Materials for PVD Coating, Custom Sizes Available
High Purity Copper Metal Materials 99.999% for Scientific Experiments
High Purity Aluminum Titanium Sputtering Material for PVD Coating
High-Purity Aluminum Titanium Coating Material for Metal Parts
Xinkang 99.9995% Purity Aluminum Materials for Vacuum Coating Customized Size
Xinkang 99.99% Purity Aluminum Ingot Metal Al Aluminum Lump Materials for Industry Usage
Custom Niv7 Sputtering Targets 99.9% Pure Nickel Vanadium Alloy Material Supplier
Premium High Purity Copper Metal Materials C10100 C11000 C12200
99.95% Pure Niti Sputtering Material Niti Sputter Coating Targets
High Purity Sputter Coating Platinum Target, Pure 99.95% Platinum Metal Magnetron Sputtering Target Material
Magnetron Sputtering Coating Materials with Different Sputtering Targets
Al, ITO, Cr Sputtering Target for Thermal Evaporation and Magnetron Sputtering Machine
Sourcing guidance for Target Magnetron Sputtering Material
What are the key technical specifications to consider when selecting sputtering targets?
When sourcing sputtering targets, the most critical factor is Purity, which typically ranges from 99.9% to 99.999% (5N) depending on the application (e.g., semiconductors require higher purity than decorative coatings). You must also specify the Relative Density, aiming for >99% to ensure process stability and minimize arcing. Additionally, verify the Grain Size and Orientation, as a fine, uniform grain structure leads to a consistent deposition rate and longer target life.
How do I ensure the material is compatible with my magnetron sputtering system?
Compatibility depends on the Geometric Dimensions (diameter, thickness, and tolerance) and the Backing Plate requirements. Ensure the supplier can provide Indium Bonding services if the target material is brittle or has low thermal conductivity. You must also confirm the Magnetic Permeability for ferromagnetic materials (like Fe, Ni, Co), as these require specialized thin targets or high-strength magnets to achieve successful plasma discharge.
What compliance and quality certifications should I request from a supplier?
Professional suppliers should provide a Certificate of Analysis (COA) for every batch, detailing impurity levels via GDMS or ICP-OES testing. For international trade, ensure compliance with RoHS and REACH standards to avoid hazardous substance restrictions. If the materials are used in the medical or aerospace sectors, look for ISO 9001:2015 quality management systems to guarantee traceability and process consistency.
What are the typical usage scenarios for different target materials?
Usage varies by industry: Rotary Targets are preferred for large-area glass coating (Low-E glass) due to higher material utilization. Planar Targets are standard for Semiconductor (PVD), Flat Panel Displays, and Optical Coatings. For decorative purposes (like watch frames or hardware), Ti, Zr, and Cr targets are commonly used to create wear-resistant and aesthetically pleasing nitride or carbide films.
Cross-Border Procurement Risks and Strategies for Sputtering Targets
How can I mitigate the risk of receiving low-purity or counterfeit materials?
Always request a pre-shipment sample for lab testing. For bulk orders, utilize Third-Party Inspection services (such as SGS or Intertek) to verify the material grade before final payment. On Made-in-China.com, prioritize Audited Suppliers who have undergone on-site factory inspections to ensure their manufacturing capabilities match their claims.
What are the best practices for negotiating price and lead times for high-value targets?
Since many targets involve precious or minor metals, pricing is often tied to Market Spot Prices (e.g., LME). Negotiate a formula-based pricing model to account for raw material fluctuations. For lead times, clarify if the supplier stocks raw ingots; customized shapes usually require 3-5 weeks for vacuum melting, pressing, and machining.
What are the specific shipping and packaging requirements for sputtering targets?
Targets are heavy yet fragile. Ensure the supplier uses Vacuum-Sealed Plastic Packaging to prevent oxidation and contamination. For international shipping, use custom wooden crates with shock-absorbing foam. Since some high-purity metals are classified as 'strategic materials,' verify if an Export License is required from the origin country to avoid customs delays.
How do I ensure transaction security in cross-border B2B payments?
Use secure payment methods such as Letters of Credit (L/C) for large volumes or Escrow-based trade assurance services provided by platforms like Made-in-China.com. This ensures that funds are only released once the Bill of Lading (B/L) and quality documents are verified, protecting your capital from non-delivery risks.


























