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Four-Target Hipims Pulse Magnetron Sputtering Deposition System for Gallium Nitride Film
US$75,000.00-100,000.00
1 set

Product profile

Customization

Available

After-sales Service

Full Time Technical Support

Warranty

One Year

Model NO.

CY-MS-SS-D500-IV

Type

Sputtering Coater

Coating

Vacuum Coating

Substrate

Steel

Certification

CE, ISO

Condition

New

Vacuum

5*10-4PA

Target Size

50mm Diameter

MFC

0-200sccm

Target Numbers

4

Transport Package

Wooden Case

Specification

total 3cbm

Trademark

CYKY

Origin

China

HS Code

8479899990

Production Capacity

10 Sets/Month

Key features

Multi-Mode Power Supply: Equipped with HiPIMS, DC, and RF power supplies for versatile film deposition.
Four Target Positions: Laboratory coater featuring 4 magnetron sputtering guns for complex film structures.
Wide Film Application: Capable of preparing ferroelectric, conductive, alloy, semiconductor, and optical films.
High Vacuum Performance: Base pressure reaches 5.0*10-4Pa with turbo-molecular and backing pumps.
Precise Gas Control: Three-channel mass flow controller (MFC) with software control for accurate deposition.
Advanced Film Monitoring: Dual-channel film thickness controller for real-time measurement and control.
OEM and ODM Services: Manufacturer offers both OEM and ODM customization services for equipment.
Comprehensive Warranty: One-year warranty coverage provided for all mechanical equipment.

Company profile

CertifiedBusiness Type: Manufacturer/Factory & Trading Company CertifiedR&D Capacity: ODM Service Available & OEM Service AvailableExport Year: 2012-09-04 CertifiedNearest Port: QingdaoAverage Response Time: ≤7.81h CertifiedTerms of Payment: LC, T/T, D/P, etc.

AI-Powered supplier vetting

SummaryZhengzhou CY Scientific Instrument Co., Ltd. is a China-based limited company established in 2013 and identified as a factory. It develops and manufactures scientific and advanced-materials equipment, including CVD systems, tube furnaces, muffle furnaces, dental furnaces, and plasma cleaners. The supplier reports more than 10 production lines, a 565.6 m² manufacturing plant, 6–10 quality-control staff, and order fulfillment within 15 workdays in both peak and off-peak periods. Its export sales share is reported at 71%–90%, with markets spanning multiple regions. The company describes research and development activity and technical accumulation, but only three R&D engineers are reported. No supplier management-system certification is listed. Trade evidence shows one transaction associated with each of three records involving the same Kazakhstan buyer, which provides limited customer-case evidence. After-sales and customization capabilities are not explicitly documented.
Supplier typeThe supplier is identified as a factory and a limited company based in Zhengzhou, China, with manufacturing activity, a stated production site, and products including furnaces, CVD systems, and plasma cleaners. Its description presents an integrated R&D, manufacturing, and management operation focused on scientific and advanced-materials equipment.
CertificationsThe supplier’s certification of management systems is explicitly recorded as “NIL.” This indicates no management-system certification is evidenced in the provided information.
R&D capabilityThe company explicitly describes itself as a scientific and technological innovation enterprise engaged in research, development, new-product development, and technical accumulation in thermal engineering and advanced-materials preparation equipment. The reported total R&D-engineer experience is 3, which supports the existence of R&D activity but does not demonstrate extensive R&D depth.
Production capacityThe supplier reports more than 10 production lines, a 565.6 m² manufacturing plant, 6–10 quality-control staff, 18 total employees, and order fulfillment within 15 workdays in both peak and off-peak seasons. These figures provide explicit evidence of operating production capacity and relatively consistent stated lead times.

Product Q&A

Q:What power supply modes does the system support?
A:
The system is equipped with HiPIMS, DC, and RF power supplies to support various film preparation needs.
Q:What types of films can be prepared with this equipment?
A:
It can prepare single-layer or multi-layer ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, and optical films.
Q:What is the base pressure of the vacuum chamber?
A:
The base pressure of the chamber is 5.0*10-4Pa.
Q:How many target positions are available?
A:
The equipment has four target positions, including 2 sets for RF sputtering, 1 set for HiPIMS and pulse DC, and 1 set for conventional DC.
Q:What is the warranty period for this machine?
A:
We provide a one-year warranty for this equipment.

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