New Designed RF and DC Power Supply Magnetron Sputtering System

Name: New Designed RF and DC Power Supply Magnetron Sputtering System
Brand: Zhengzhou CY Scientific Instrument Co., Ltd.
SKU: 736087392

Henan, ChinaZhengzhou CY Scientific Instrument Co., Ltd.

US$32,000.00-36,000.00

1 Piece

Product profile

Customization

Available

Warranty

One Year

Application

Industry, School, Lab

Model NO.

CY-VTC-600-2HD

Customized

Certification

Structure

Vertical

Material

Stainless Steel

Type

Coating

Transport Package

Plastic Paper Inside,Polyfoam Filled,Wooden Box Ou

Specification

customized

Trademark

CYKY

Origin

China

HS Code

8486202200

Production Capacity

199/Month

Key features

Dual Target System: Integrated DC source for metals and RF source for non-metals in one control box.

Film Thickness Tracker: Enables easy monitoring of coating progress and data recording.

Wide Material Compatibility: Suitable for ferroelectric, conductive, alloy, semiconductor, ceramic, and optical substrates.

Customization Available: Customized coater options including 2 DC heads, RF only, or 3 RF heads available.

Lifetime Support: Comes with a one-year limited warranty and lifetime technical support.

Compact Design: Ideal for R&D labs with mobile pump station and easy target exchange.

High Vacuum Level: Achieves 10^-6 torr with turbo pump and chamber baking capability.

Company profile

Zhengzhou CY Scientific Instrument Co., Ltd.

Henan, China

CertifiedBusiness Type: Manufacturer/Factory & Trading Company CertifiedR&D Capacity: ODM Service Available & OEM Service AvailableExport Year: 2012-09-04 CertifiedNearest Port: QingdaoAverage Response Time: ≤5.96h CertifiedTerms of Payment: LC, T/T, D/P, etc.

AI-Powered supplier vetting

SummaryZhengzhou CY Scientific Instrument Co., Ltd. is a China-based limited company established in 2013 and identified as a factory. It develops and manufactures scientific and advanced-materials equipment, including CVD systems, tube furnaces, muffle furnaces, dental furnaces, and plasma cleaners. The supplier reports more than 10 production lines, a 565.6 m² manufacturing plant, 6–10 quality-control staff, and order fulfillment within 15 workdays in both peak and off-peak periods. Its export sales share is reported at 71%–90%, with markets spanning multiple regions. The company describes research and development activity and technical accumulation, but only three R&D engineers are reported. No supplier management-system certification is listed. Trade evidence shows one transaction associated with each of three records involving the same Kazakhstan buyer, which provides limited customer-case evidence. After-sales and customization capabilities are not explicitly documented.

Supplier typeThe supplier is identified as a factory and a limited company based in Zhengzhou, China, with manufacturing activity, a stated production site, and products including furnaces, CVD systems, and plasma cleaners. Its description presents an integrated R&D, manufacturing, and management operation focused on scientific and advanced-materials equipment.

CertificationsThe supplier’s certification of management systems is explicitly recorded as “NIL.” This indicates no management-system certification is evidenced in the provided information.

R&D capabilityThe company explicitly describes itself as a scientific and technological innovation enterprise engaged in research, development, new-product development, and technical accumulation in thermal engineering and advanced-materials preparation equipment. The reported total R&D-engineer experience is 3, which supports the existence of R&D activity but does not demonstrate extensive R&D depth.

Production capacityThe supplier reports more than 10 production lines, a 565.6 m² manufacturing plant, 6–10 quality-control staff, 18 total employees, and order fulfillment within 15 workdays in both peak and off-peak seasons. These figures provide explicit evidence of operating production capacity and relatively consistent stated lead times.

Product Q&A

Q:What kind of thin films can this dual-target sputtering machine prepare?

It can prepare metal films, oxide films, nitride films and semiconductor films. Dual-target design allows co-sputtering and multi-layer thin film deposition for material science and semiconductor laboratory research.

Q:Does the desktop dual-target sputtering system support sample heating and rotating?

Yes. It is equipped with a heating and rotating sample stage, maximum temperature up to 500 adjustable rotation speed, ensuring uniform and stable thin film coating results

Q:Can you customize the chamber size and target configuration?

Custom service is available. We can upgrade more targets, larger chamber, RF,DC power combination and fully automatic control system according to customers experimental requirements.