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WF6 Gas - 5N 99 999% for Precision Semiconductor CVD Tungsten Deposition
US$150.00
1 kg
Product profile
Customization
AvailableCAS No.
7783-82-6Formula
WF6Model NO.
WF6Constituent
Industrial Pure AirGrade Standard
Electronic GradeChemical Property
Non-Flammable GasPurity
5N 99.999%Product Type
Electronic Specialty GasApplication 1
Semiconductor CVD Tungsten DepositionApplication 2
Semiconductor Wafer FabricationApplication 3
Tungsten Thin Film DepositionApplication 4
Photovoltaic Thin Film ProcessValve Type
DISS638Packaging
Specialty Gas CylinderSupply Form
Cylinder Supplied Specialty GasTarget Industry
Semiconductor and PhotovoltaicKey Process
CVD Tungsten Film DepositionTransport Package
CylinderSpecification
47LTrademark
KAIMEIOrigin
CHINAKey features
Extremely low moisture and non-volatile residues avoid wafer surface defects.
Advanced purification technology effectively eliminates trace metal and organic impurities.
Strict batch production control maintains consistent gas quality all the time.
Company profile
CertifiedBusiness Type: Trading CompanyExport Year: 2020-10-01 CertifiedNearest Port: Shanghai PortAverage Response Time: ≤2.71h CertifiedTerms of Payment: LC, T/T CertifiedInternational Commercial Terms(Incoterms): FOB, CIF, CFR
About Our Factory & Business Background
AddressRoom 1104, Building B, Hengtai Ideal Innovation Building, No. 69 Jiuzhang Road, Suzhou Industrial Park, Suzhou, Jiangsu, China
Plant Area100 square meters
Registered Capital10,000,000 RMB
Average Lead TimePeak Season Lead Time: one month Off Season Lead Time: one month
Our Production Capability & Technical Expertise
Main ProductsElectronic Gas Disinfectant
Our Industry Experience & Global Business Record
Year of Establishment2016-08-18
Main MarketsSoutheast Asia/ Mideast
Number of Foreign Trading Staff6
Overseas Agent/BranchNo
Product Q&A
Q:What purity of WF6 gas is available for semiconductor CVD?
A:
KAIMEI supplies 5N High Purity Tungsten Hexafluoride WF6 Gas, equivalent to 99.999% purity. It is intended for customers looking for 5N WF6 Gas for Semiconductor CVD and tungsten film deposition applications.
Q:How is WF6 gas used in semiconductor wafer fabrication?
A:
WF6 Precursor Gas is used in CVD-related tungsten deposition processes to form tungsten films in semiconductor manufacturing. Buyers should confirm the required process conditions and equipment compatibility before purchase.
Q:What cylinder sizes and net weights are available for WF6 gas?
A:
The available configurations include a 10L WF6 Gas Cylinder with 20kg net weight and 40L, 44L or 47L WF6 Gas Cylinders with 50kg net weight.
Q:Which valve is used on the WF6 gas cylinder?
A:
The listed WF6 configurations use a DISS638 Valve. Buyers should confirm whether the WF6 Gas Cylinder with DISS638 Valve matches their gas cabinet and delivery system before ordering.
Q:Can WF6 be used for photovoltaic thin-film applications?
A:
WF6 may be considered for certain Photovoltaic Thin Film Applications involving tungsten-based thin-film processes. Because requirements vary by equipment and process design, technical compatibility should be evaluated by the buyer before mass production.
Send Inquiry
*To:Jiangsu Kaimei Electronic Materials Co., Ltd.
Jiangsu Kaimei Electronic Materials Co., Ltd.*Content:
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