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Advanced Silicon Precursor for Semiconductor Manufacturing - Bdeas C8h22n2si
US$5.00
200 Pieces
Sample price:US$5.00/piece.Request sample
Product profile
Customization
AvailableCAS No.
27804-64-4Formula
C8h22n2siModel NO.
C8h22n2siEINECS
631-070-6Certification
REACHEnvironmental Protection
YesAppearance
LiquidColor
WhiteSpecification
200LTrademark
ZYDOrigin
ShanghaiKey features
Low Temperature ALD: Suitable for low-temperature atomic layer deposition of hafnium silicate films.
Excellent Tunability: Enables excellent tunability of HfSiOx film composition.
Versatile Film Deposition: Used for ALD of SiO2, HfO2, or HfSiOx films with ozone.
Fast Hydrolytic Reaction: Reacts rapidly with moisture, water, and protic solvents.
REACH Certified: Product meets REACH certification and environmental protection standards.
Company profile

Shanghai Zhongyida New Materials Co., LtdShanghai, China
CertifiedBusiness Type: Trading CompanyExport Year: 2024-07-23Nearest Port: ShanghaiAverage Response Time: ≤5.90hTerms of Payment: LC, T/T, D/PInternational Commercial Terms(Incoterms): FOB, EXW, CIF, DDP
About Our Factory & Business Background
AddressShanghai, China
Registered Capital10,000,000 RMB
Average Lead TimePeak Season Lead Time: 1-3 months Off Season Lead Time: 1-3 months
Our Production Capability & Technical Expertise
Main ProductsSemiconductor Gas, Medical Gas, Industrial Gas, Precursors, Special Gas, Rare Gas, Xenon Gas, Helium Gas, N2o, Cream Charger
Our Industry Experience & Global Business Record
Year of Establishment2011-03-16
Main MarketsNorth America, Eastern Europe, Southeast Asia, Eastern Asia, Western Europe, Mid East, South America, Africa
Product Q&A
Q:Is this product suitable for low-temperature ALD?
A:
Yes, it is studied and evaluated as a liquid-phase silicon precursor for low-temperature atomic layer deposition.
Q:What films can be deposited using this precursor?
A:
It is suitable for depositing SiO2, HfO2, or HfSiOx films when used with ozone.
Q:How does BDEAS react with moisture?
A:
It reacts rapidly with moisture, water, and protic solvents.
Q:Does the product meet environmental standards?
A:
Yes, it is REACH certified and meets environmental protection requirements.
Q:What is the CAS number for this precursor?
A:
The CAS number is 27804-64-4.
Send Inquiry
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Shanghai Zhongyida New Materials Co., Ltd
Shanghai Zhongyida New Materials Co., Ltd*Content:
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