Multi-Speed Programmable Control: Support multi-stage speed & time program setting, store multiple spin coating recipes for different photoresist and wafer materials.
Clear Digital LCD Display: Real-time show running speed, working time and operation mode, intuitive parameter viewing for lab operators.
Independent Pump Control Button: Separate pump switch to precisely adjust liquid dispensing volume, avoid excessive photoresist waste.
Multi Functional Operation Mode: Built-in Easy Mode and Program Mode to meet simple single-layer coating and complex multi-step coating experiments.
High Stability Rotary Chuck: Anti-vibration rotating platform effectively eliminates uneven coating film and edge ripple defects on silicon wafers.
Fully Sealed Stainless Steel Chamber: Prevent photoresist solvent volatilization pollution, protect lab environment and reduce equipment corrosion.
Easy One-Click Operation: Intuitive physical button layout, no complicated training required for new lab staff to complete spin coating.