Powered by Made-in-China.com
Lanthanum Sputtering Target La for La2O3 Dielectrics, Optical Coatings and Lanthanum Doped Thin Films
US$140.00
1 kg
Product profile
Type
Metal TargetShape
CustomizeCertification
ISOModel NO.
ET-LaSTProduct name
Lanthanum Sputtering TargetEr Content
99.9%-99.99%Size
CustomizeStorage
dry, sealed containerTransport Package
BarrelSpecification
50kg per barrelTrademark
Eternal-ElementOrigin
ChinaCompany profile
Business Type: Trading CompanyAverage Response Time: ≤4.85h
About Our Factory & Business Background
AddressRoom 310, Building 1, No. 326 Jinyuan 3rd Road, Jiading District, Shanghai, China
Average Lead TimePeak Season Lead Time: one month Off Season Lead Time: within 15 workdays
Our Production Capability & Technical Expertise
Main ProductsErbium Oxide, Holmium Oxide, Thulium Oxide, Ytterbium Oxide, Lutetium Oxide, Yttrium Oxide, Scandium Oxide, Hafnium Oxide, Tantalum Oxide, Germanium Oxide
Our Industry Experience & Global Business Record
Main MarketsNorth America, Oceania, Western Europe
Send Inquiry
*To:
Shanghai Sheeny Metal Mateirals Co., Ltd.
Shanghai Sheeny Metal Mateirals Co., Ltd.*Content:
Supplier replies will be sent to your registered email
You may also like
Customized Size 99.99% Znse Sputtering Target for Optical Coatings and Semiconductor Applications
US$110.00-120.00
1 Piece(MOQ)
Iwo Sputtering Target In2o3/ Wo3 Tungsten Doped Indium Oxide Ceramic Target for Optical Coating
US$110.00-120.00
1 Piece(MOQ)
High-Purity Titanium Silicon Tisi Sputtering Target for Semiconductor IC, Advanced Packaging & Dielectric Coatings
US$200.00-1,000.00
1 Piece(MOQ)
High Purity 99.99% & 99.999% Tungsten Sputtering Target for Thin Film Coating, Wolfram
US$100.00-300.00
1 kilograms(MOQ)
High Purity Ru Target Sputtering Target for PVD Coating China Manufacturer Supply
US$700.00
1 Piece(MOQ)
High Purity ZnO Ceramic Sputtering Target for Customized Optical Coating Applications
US$110.00-120.00
1 Piece(MOQ)
High Purity Tantalum Metal Sputtering Target for Thin Film Coating, Titanium/Rhodium /Ruthenium Sputtering Target
US$700.00-1,000.00
1 Piece(MOQ)
AlN Target Aluminium Nitrogen Sputtering Target for Optical Thin Film Coating/Semiconductor
US$100.00-130.00
1 kg(MOQ)
High Purity 99.999% Tungsten W Target Tungsten Metal Sputtering Target for Coating
US$200.00
1 Piece(MOQ)
Titanium Aluminum Alloy PVD Targets/Titanium Sputtering Targets/Tial Alloy Target for Coating
US$80.00-300.00
1 Piece(MOQ)
Molybdenum Target for Vacuum Sputtering Coating
US$45.00
1 kg(MOQ)
99.99 % Purity Gold Au Target for Magnetron Sputtering Coating
US$230.00-500.00
1 Set(MOQ)