99.99 % Purity Gold Au Target for Magnetron Sputtering Coating

Name: 99.99 % Purity Gold Au Target for Magnetron Sputtering Coating
Brand: Zhengzhou KS Instrument Equipment Co., Ltd.
SKU: 2170533042

Henan, ChinaZhengzhou KS Instrument Equipment Co., Ltd.

US$230.00-500.00

1 Set

Product profile

Customization

Available

Type

Metal Target

Shape

Round

Model NO.

KS-ST

Product Name

Au Sputtering Target

Applicable Equipment

Magnetron Sputtering PVD Coating Machine

Application Field

Semiconductor, Optoelectronics, Lab Thin Film Rese

Size

Customizable

Transport Package

Cardboard Box

Specification

Purity 99.99%(4N)

Trademark

Origin

China

Key features

99.99% Ultra High Purity Gold Au Material, Extremely Low Impurity, Ensure High Uniform Conductive Thin Film Deposition Without Contamination

Custom Copper Backing Bonded Design, Excellent Thermal Conductivity, Effectively Prevent Target Deformation & Crack During Long-Time Sputtering

Round Shape Au Sputtering Target, Support Custom Diameter, Thickness & Bonding Process, Perfectly Match 2/4/6/8 Inch Magnetron Sputtering Guns

Wide Compatibility for Semiconductor Wafer, Optical Glass, ITO Conductive Glass & Biomedical Thin Film Coating Experiments

KS Brand Factory Direct Production, Dense Grain Structure, Stable Sputtering Performance for Continuous Lab & Industrial PVD Coating

Company profile

Importers and Exporters

Zhengzhou KS Instrument Equipment Co., Ltd.

Henan, China

CertifiedBusiness Type: Manufacturer/Factory & Trading Company CertifiedR&D Capacity: ODM Service Available & OEM Service Available CertifiedCustomization Options: Customization from Samples, Customization from Designs, etc. CertifiedNearest Port: Shanghai PortAverage Response Time: ≤0.89h CertifiedTerms of Payment: LC, T/T, D/P, etc.

About Our Factory & Business Background

AddressZhengzhou, Henan, China

Number of Employees13

Registered Capital2,000,000 RMB

International Commercial Terms(Incoterms)FOB, CIF, CFR, EXW

Average Lead TimePeak Season Lead Time: within 15 workdays, one month, 1-3 months Off Season Lead Time: within 15 workdays, one month, 1-3 months

Minimum Order Quantity1 unit

Supply Chain Partners10

Our Production Capability & Technical Expertise

Main ProductsMagnetron Sputtering, Laboratory PVD Coating, Thermal Evaporation Coating, Spin Coater, Vacuum Atmosphere Furnace, CVD Furnace, Dental Furnace, Plasma Cleaner, Plasma Coating, Lab Heating Equipment

Inspection Type for Finished Products100% inspection(Visual inspection & Function inspection)

Inspection Method for Finished ProductsFinished product checked by packing staff

Our Industry Experience & Global Business Record

Main MarketsNorth America

Repeat Buyers Choice30%~50%

Number of Foreign Trading Staff4

Our Certifications, Standards & Industry Recognition

Product CertificationCE

Product Q&A

Q:What purity grade can your gold sputtering target provide?

We supply 99.99% (4N) ultra-high purity Au gold target with extremely low impurity content, which avoids contamination of thin films and guarantees stable conductive coating performance.

Q:Can you customize the size and shape of round Au sputtering target?

Yes, we support customized diameter, thickness and bonding process. Round shape is standard, square target is also available. Our target fits 2/4/6/8 inch magnetron sputtering guns.

Q:Does the gold target come with copper backing plate?

Two options for you: pure gold target without backing, and gold target bonded with copper backing plate. Copper backing improves thermal conductivity and prevents target crack during long-time sputtering.

Q:What fields is this Au sputtering target suitable for?

It is widely used in semiconductor wafer coating, optical glass, ITO conductive glass, biomedical material, new energy battery and university material lab thin film deposition experiments.