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Ultra High Purity Ta1 Tantalum Rod for Semiconductor Sputtering Target
US$492.00
1-49 kg
US$453.00
50+ kg
Product profile
Customization
AvailableCharacteristic
Stable Electrical Behavior, Low WeightProtection
Resistance to Corrosion, High Melting PointModel NO.
Ta1Usage
ElectronicsShape
Solid Round Tantalum RodConcentrate or Not
Non-concentrateProduct Name
Ultra High Purity Tantalum Rod for Semiconductor CGrade
Ta1Purity
≥99.95% (3n5), 99.99% (4n) OptionalMelting Point
2996℃MOQ
1gkLead Time
Stock 15-20days, Custom 20-25daysGas Impurity Control
Ultra-Low O/C/N/H Content, Low Outgassing RateDiameter Range
3mm-100mm, Ultra-Thin Micro Rod CustomizableLength Range
10mm-2000mm, Arbitrary Cutting SupportedSurface State
Pickled Matte / Fine Mirror Polishing (Ra≤0.8μm)Processing State
Full Vacuum Stress Relief Annealed, Grain ControllCore Technical Index
U & Th ≤10ppb, Ultra-Low O/C/N/H Gas ImpurityInspection Certificates
Gdms Element Report, Leco Gas Test, SGS MetallurgyMelting Technology
Vacuum Electron Beam Single Crystal MeltingSputtering Performance
Stable Sputter Yield, Uniform Thin Film DepositionOrigin
Baoji, Shaanxi, ChinaProduction Capacity
500 Tons/YearKey features
Vacuum electron beam single crystal melting raw material, minimal trace metallic impurities
Ultra-high purity grade, optional 3N5/4N/4N5 to match different wafer process standards
Ultra-low O/C/N/H gas content, extremely low outgassing in high vacuum coating chamber
Controlled rolling & annealing, uniform grain and stable crystal texture for consistent sputtering
Dense internal structure without pores & segregation, no local abnormal sputtering area
Ultra-low impurity migration, avoid silicon wafer surface contamination during thin film deposition
Excellent precision machinability, support grinding, threading and copper backplate bonding
Super smooth polished surface optional, no residual oxide layer before target manufacturing
Non-magnetic property, no interference to precision semiconductor coating equipment
Meet international semiconductor material audit standards, complete factory inspection records
Company profile
Business Type: Manufacturer/Factory CertifiedCustomization Options: Customization from Samples, Customization from Designs CertifiedNearest Port: Shanghai PortAverage Response Time: ≤0.72h CertifiedTerms of Payment: T/T CertifiedInternational Commercial Terms(Incoterms): FOB, CIF, CFR, EXW
AI-Powered supplier vetting
SummaryShaanxi Mingsheng Guangpu Metal Materials Co., Ltd. is a trade company located in Baoji, Shaanxi, specializing in the production, R&D, and sales of titanium, nickel, and zirconium materials. The company has an ISO9001:2015 certification, exports primarily to East Asia, and has a significant export sales percentage. While its financial credibility is supported by an AAA credit rating, other areas such as after-sales service capability and innovation capability lack sufficient information for a comprehensive assessment.
Supplier typeThe supplier is classified as a trade company located in Baoji, Shaanxi, focusing on manufacturing titanium, nickel, and zirconium materials.
CertificationsThe company holds an ISO9001:2015 certificate, indicating a recognized quality management system.
Financial creditThe supplier has an AAA enterprise credit rating, suggesting strong financial credibility.
Production capacityThe supplier is involved in precision forging and processing, with the ability to produce a variety of titanium and nickel products.
Customization capabilityThe company can design and manufacture non-standard chemical equipment and specialized titanium and nickel products based on user requirements.
Product Q&A
Q:What tantalum grade is used for semiconductor wafer coating?
A:
Ta1 UNS R05200 electronic semiconductor grade, ultra low radioactive impurities.
Q:What purity levels can you supply for chip manufacturing?
A:
Standard 99.95%, customized 99.99% and ultra-high 99.995% purity.
Q:Why strictly control U and Th elements for semiconductor tantalum rod?
A:
Radioactive trace elements will cause hidden circuit defects on silicon wafer thin film.
Q:Will this tantalum rod release lots of gas inside vacuum coating chamber?
A:
Ultra-low O/C/N/H gas impurities, extremely low outgassing rate to keep chamber clean.
Q:Is pure tantalum magnetic and disturb coating equipment sensors?
A:
Pure tantalum is non-magnetic, no interference to precision coating monitoring parts.
Send Inquiry
*To:
Shaanxi Mingsheng Guangpu Metal Materials Co., Ltd.
Shaanxi Mingsheng Guangpu Metal Materials Co., Ltd.*Content:
Supplier replies will be sent to your registered email
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